2010

Carbon layers cleaning from inside of narrow gaps by a RF glow discharge

Autori: 
C. Stancu, M. Teodorescu, A. C. Galca, G. Dinescu
Anul: 
2010

Characterization of a radiofrequency plasma beam used for deposition of carbon nanomaterials

Autori: 
S. D. Stoica, S. Vizireanu, B. Mitu, T. Acsente, G. Dinescu
Anul: 
2010

Investigation of small dimension atmospheric pressure cold plasma jets using imaging spectroscopy

Autori: 
T. Acsente, M. Bazavan, M. Teodorescu, M. D. Ionita, E. R. Ionita, G. Dinescu
Anul: 
2010

Radiofrequency discharge configurations for plasma processing of narrow tubes at atmospheric pressure

Autori: 
M. Teodorescu, C. Stancu, E.R. Ionita, E.C. Stancu, G. Dinescu
Anul: 
2010

Structural and photoluminescence properties of Nd3+-activated nanostructured titanium oxide films produced by RF sputtering

Autori: 
R. Bartali, G. Alombert-Goget, G. Gottardi, S. Guddala, I. Luciu, V. Micheli, J. Perri
Anul: 
2010

Hydrogen effect on structure and mechanical properties of ZnO films deposited in Ar/H2 plasma

Autori: 
R. Bartali, V. Micheli, G. Gottardi, I. Luciu, N. Laidani
Anul: 
2010

Empirical method for Ti oxidation state determination in undoped and doped titania films by Auger electron spectroscopy

Autori: 
V. Micheli, R. Bartali, G. Gottardi, I. Luciu, J. Perri
Anul: 
2010

RF sputtering of oxide films in Ar and Ar-H2 gas mixtures: role of H incorporation in developing transparent conductive coatings

Autori: 
G. Gotardi, R. Bartali, V. Micheli, I. Luciu, N. Laidani
Anul: 
2010

Properties of composite a-C:H/metal layers deposited by combined RF PECVD/Magnetron sputtering techniques

Autori: 
T. Acsente, E. R. Ionita, D. Colceag, A. Moldovan, C. Luculescu, G. Dinescu
Anul: 
2010

OES monitoring of combined deposition of C/W layers by PECVD/Magnetron Sputtering techniques

Autori: 
T. Acsente, E. R. Ionita, C. Stancu, M. D. Ionita, G. Dinescu
Anul: 
2010
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