Journals

Annealing of hydrogen-induced defects in RF-plasma-treated Si wafers: ex situ and in situ transmission electron microscopy studies

Autori: 
Ghica, C; Nistor, LC; Vizireanu, S; Dinescu, G
Anul: 
2011
DOI: 
http://dx.doi.org/10.1088/0022-3727/44/29/295401

OES monitoring of sequential deposition of C/W layers by PECVD/magnetron sputtering techniques

Autori: 
Acsente, T; Ionita, ER; Stancu, C; Ionita, MD; Dinescu, G; Grisolia, C
Anul: 
2011
DOI: 
http://dx.doi.org/10.1016/j.surfcoat.2011.03.085

(Ti,Cr,Nb)CN coatings deposited on nitrided high-speed steel by cathodic arc method

Autori: 
Braic, M; Braic, V; Balaceanu, M; Vladescu, A; Zoita, CN; Lungu, CP; Grigorescu, CEA; Grigore, E; Logoftu, C
Anul: 
2011
DOI: 
http://dx.doi.org/10.1016/j.surfcoat.2011.03.030

Periodicity property of relativistic Thomson scattering with application to exact calculations of angular and spectral distributions of the scattered field

Autori: 
Popa, A
Anul: 
2011
DOI: 
http://dx.doi.org/10.1103/PhysRevA.84.023824

Synthesis and Laser Immobilization onto Solid Substrates of CdSe/ZnS Core Shell Quantum Dots

Autori: 
Gyorgy, E; del Pino, AP; Roqueta, J; Ballesteros, B; Miguel, AS; Maycock, CD; Oliva, AG
Anul: 
2011
DOI: 
http://dx.doi.org/10.1021/jp203051b

Performance of W coatings on CFC with respect to carbide formation

Autori: 
Maier, H; Rasinski, M; Grigore, E; Ruset, C; Greuner, H; Boswirth, B; Matthews, GF; Balden, M; Lindig, S
Anul: 
2011
DOI: 
http://dx.doi.org/10.1016/j.jnucmat.2010.08.049

Influence of beryllium carbide formation on deuterium retention and release

Autori: 
Porosnicu, C; Anghel, A; Sugiyama, K; Krieger, K; Roth, J; Lungu, CP
Anul: 
2011
DOI: 
http://dx.doi.org/10.1016/j.jnucmat.2010.12.238

Consequences of deuterium retention and release from Be-containing mixed materials for ITER Tritium Inventory Control

Autori: 
Sugiyama, K; Roth, J; Anghel, A; Porosnicu, C; Baldwin, M; Doerner, R; Krieger, K; Lungu, CP
Anul: 
2011
DOI: 
http://dx.doi.org/10.1016/j.jnucmat.2010.09.043

Silicon structuring by etching with liquid chlorine and fluorine precursors using femtosecond laser pulses

Autori: 
Radu, C; Simion, S; Zamfirescu, M; Ulmeanu, M; Enculescu, M; Radoiu, M
Anul: 
2011
DOI: 
http://dx.doi.org/10.1063/1.3619856

Controlled removal of overpainting and painting layers under the action of UV laser radiation

Autori: 
Apostol, I; Damian, V; Garoi, F; Iordache, I; Bojan, M; Apostol, D; Armaselu, A; Morais, PJ; Postolache, D; Darida, I
Anul: 
2011
DOI: 
http://dx.doi.org/10.1134/S0030400X11080054
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