Efficient relaxation of strained-SiGe layers induced by thermal oxidation

Publication type: 
Journal
Autori: 
Jang, JH; Son, SY; Lim, W; Phen, MS; Siebein, K; Craciun, V
Anul: 
2010
DOI: 
http://dx.doi.org/10.1016/j.tsf.2009.09.146

Journal data

Journal: 
THIN SOLID FILMS
Vol.: 
518
Pag.: 
2462 2465