Skin Layer Defects in Si by Optimized Treatment in Hydrogen RF Plasma

Publication type:

Journal

Autori:

Ghica, C; Nistor, LC; Vizireanu, S; Dinescu, G; Moldovan, A; Dinescu, M

Anul:

2010

DOI:

http://dx.doi.org/10.1002/ppap.201000066

Journal data

Journal:

PLASMA PROCESSES AND POLYMERS

Vol.:

Pag.:

986 991