NANO-FUNCTIONAL MATERIALS, Synthesis, processing and characterization of nanoscale multi functional oxide films VII, Symposium O, E-MRS 2019 Spring Meeting, Nice, France, 27-31 May 2019
Good control of oxide films thickness, composition and structure offers the possibility to integrate in heterostructures new functionalities. Progress in synthesis, processing and characterization of multifunctional oxide films plays a key role for the development of new devices, from microelectronics to energy and environment applications. One of the symposium organizers is Valentin Craciun from the National Institute for Laser, Plasma and Radiation Physics (NILPRP).
Oxides can present a vast range of functional tunable properties, such as ferroelectricity, ferromagnetism, multiferroicity, electrical conductivity, superconductivity, thermoelectricity, optical transparency, catalytic behavior, high temperature barriers, or thermochemical protection among others. These properties can lead to innovative applications, which in many cases will require thin films with controlled properties suitable to offer high performance devices.
The functional properties of the oxides are extremely dependent on changes in the crystal structure, composition, and defects. The complexity of oxides and the relevance of their microstructure on the properties make the deposition of thin films critical. The control of thin films growth, coupled with accurate characterization tools for structure, composition and properties, modeling, and theoretical understanding, are prerequisites for further development of new high performance oxide-based materials for device applications. In this respect, the effects of strain, interfaces, defects, composition and doping, which are key parameters allowing the tuning of properties must be fully understood at the microscopic as well as at the macroscopic level. Interface phenomena between oxides but also between oxides and other materials, are also relevant as new properties can emerge. In concert with sustainable development, the avoidance of polluting, toxic, or scarce chemical elements is another major technological objective. Moreover, many applications require the use of low cost deposition methods while others require the integration of the oxides on suitable platforms, such as semiconducting wafers or flexible substrates.
This symposium follows a series of six very successful and well attended E-MRS symposia organized from 2006 to 2017. The symposium intends to continue the established tradition of an interdisciplinary forum that will bring together scientists involved in various aspects of the synthesis, processing characterization, device integration and theoretical modeling of multi-functional oxide-based thin films, multilayers and nanostructures to discuss the latest developments and future trends and challenges.
Hot topics to be covered by the symposium
- Growth of oxide thin films by physical & chemical methods, including advanced & novel techniques.
- Growth and properties of complex heterostructures, including superlattices
- Growth and properties of nanocomposite or hybrid oxide based thin films
- Integration of oxides on semiconductors
- Oxide nanosheets, & films on flexible substrates
- Epitaxial stabilization of metastable phases
- Defects in oxide thin films and at interfaces
- In situ characterization of oxide film growth
- Advanced characterization by microscopies & spectroscopic techniques
- Ferroelectric, ferromagnetic, & multiferroic oxides
- Oxide films for energy generation & conservation
- Transparent conducting oxides
- Wilfrid Prellier, CRISMAT, Caen, France: "Growth of oxide films using combinatorial substrate epitaxy"
- Emmanuel Defay, LIST, Luxembourg: "Inkjet printed transparent piezoelectric thin films for transducers on glass"
- Johan E. ten Elshof, MESA+ Institute for Nanotechnology, University of Twente, The Netherlands: "2D metal oxide nanosheets: synthesis and applications in advanced electronic materials"
- Magdalena Nistor, NILPRP, Magurele-Bucharest, Romania: "Oxide thin films by pulsed electron beam deposition: growth and properties"
- Bénédicte Warot-Fonrose, CEMES-CNRS, Toulouse, France: "Quantitative electron microscopy on oxides : local strain and chemistry mapping"
- Ying Hao Chu, Natl Chiao Tung Univ, Taiwan: "Growth of van der Waals oxide heteroepitaxy for transport soft electronics"
- Francisco Rivadulla, Univ. de Santiago de Compostela, Spain: "Growth of epitaxial oxides by chemical and physical methods: impact on the structural and magnetic properties"
- Elvira Fortunato, Univ Nova Lisboa, Portugal: TBA
- Uwe Schroeder, NaMLab gGmbH, Germany: "Impact of deposition process parameters on the ferroelectric properties of doped hafnia films"
- Robert Hoye, University of Cambridge, UK: "Rapid growth of oxides onto perovskite solar cells through chemical vapour deposition for improved performance and mechanical protection"
- C. Himcinschi, Germany: "Raman spectroscopy as a versatile tool for complex oxides characterisation: from ferroelastic domain wall tilting to orbital ordering"
- Fabio Miletto Granozio, Italy: "Tayloring the properties of 2D electron gases at oxide interfaces by atomic engineering of epitaxial growth"
- A Klein, Germany, Darmstadt University, Germany: "Limits of the Fermi energy in oxides"
- Zhong Lin (Z.L.) Wang, Georgia Institute of Technology, USA: "Oxide based piezotronics"
The proceedings of this symposium are to be published as a special issue of Thin Solid Films, and manuscripts can now be accepted on-line, with a final deadline of June 20. We encourage you to submit a manuscript, to record your participation in this important symposium.
The submission, and peer review process will be managed entirely online using Elsevier's Editorial System (EES)
• The submission website for this journal is located at: http://ees.elsevier.com/tsf/default.asp
• To ensure that all manuscripts are correctly identified for inclusion in this special issue, it is important that you select ‘VSI: E-MRS Oxide Films VII’ when reaching the “Select an Article Type” step in the submission process.
You will need to register with the Elsevier site (unless you already have a username/password with them); then log-in as an author; then click to submit a new manuscript. When asked to ‘Choose article type', there is a drop-down menu, which includes 'VSI: E-MRS Oxide Films VII'.
We suggest a manuscript length of 4 - 5 pages.
Guide for Authors: https://www.elsevier.com/journals/thin-solid-films/0040-6090/guide-for-a...
Institut de Ciencia de Materials de Barcelona (ICMAB-CSIC)
Campus de la UAB Bellaterra E-08193 Spain
Phone : (+34) 935801853
Mail : firstname.lastname@example.org
University of Rennes 1
Institut des Sciences Chimiques, Solid State Chemistry and Materials Group, Bat 10A, Campus de Beaulieu, 35042 Rennes Cedex, France
Phone : +33 2 23235655
Mail : email@example.com
National Institute for Laser, Plasma and Radiation Physics and Extreme Light Infrastructure-Nuclear Physics, Magurele, Romania
Mail : firstname.lastname@example.org
University of Cambridge
Materials Science Dept.- 27 Charles Babbage Road, Cambridge, CB3 0FS, U.K.
Phone : +44 1223 334326
Mail : email@example.com
A brief presentation of the symposium is found on the EMRS website: