3rd International Conference on Applied Surface Science - ICASS 2019

The 3rd International Conference on Applied Surface Science will be held at the Pisa Congress Palace, Pisa, Italy from the 17-20 June 2019. The conference will report on and discuss current research on the role and use of surfaces in chemical and physical processes, related to catalysis, electrochemistry, energy, new/functional materials and nanotechnology. Also the various techniques and characterization methods will be discussed.
This is a significant opportunity for you to hear from leading scientists in the area and to network with colleagues in industry and academia to ensure you keep abreast of recent developments in this fast evolving field. One of the Conference Chairs is Dr. Maria Dinescu from the National Institute for Laser, Plasma and Radiation Physics.

Conference topics:

• Surface science of catalysis, electrocatalysis and photocatalysis
• Surface engineering and functionalization
• Functional surfaces and coatings
• Surface science applied to energy conversion and storage
• Surface nanotechnology and devices
• Biointerfaces
• Electrochemistry at surfaces and interfaces
• Advances in surface characterization tools
• Environmentally-friendly materials
• Semiconductors – surface and interface
• 2D layered materials and assembling

Invited speakers/ Plenary Speakers:

• Xinhe Bao, University of Science and Technology of China & Dalian Institute of Chemical Physics, China
• David B. Geohegan, Oak Ridge National Laboratory, US
• Claire-Marie Pradier, Institut de Chimie du CNRS, France
• Koji Sugioka, RIKEN Center for Advanced Photonics, Japan

Conference deadlines:

Deadline for abstract submission - 18 January 2019
Author registration & Early bird deadline – 12 April 2019

Conference Chairs:

• Mario Rocca, Università degli Studi di Genova, Italy
Maria Dinescu, National Institute for Lasers, Plasma and Radiation Physics (INFLPR), Romania
• WeiXin Huang, University of Science and Technology of China (USTC), China

Organising committee:

• Henrik Rudolph, Netherlands Defence Academy, Netherlands

Please visit https://www.elsevier.com for details regarding the conference.