Resources available for project

Resources available for project (human, equipments, others):
The senior researchers from the partners involved in the project, one research institute, one University and one SME, PhD in the domains of science and engineering of oxide materials, physics of condensed matter, general chemistry, electronics, optics, which will be undertaking the research and development work, have previous rich experience relevant to all the tasks attributed in the project, related to sol-gel and chemical processes, RFMS and PLD deposition, structural, microstructural, magnetic, optical and electrical characterization, and also to design and fabrication of optoelectronic devices. There are also involved in the project young researchers, PhD students, which will study and learn research procedures and will apply the knowledge in PhD thesis finalization.

The existing equipment which will cover, together with some subcontracting analysis, all needs of the project, is presented below, for the three partners.

CO-Existent equipment: The coordinator CO, INFLPR is equipped with: Balzers BA 510, thin films evaporation plant; RF magnetron-sputtering VARIAN ER 3119, technological equipment for thin films processing; Leybold electron gun for thin films evaporation and beam figuring; spin-coater for sol-gel thin films deposition; BALZERS QMG 100, quadrupolar mass spectrometer; NOMAD, USA, atomic force microscope; DRON DART-UM X-ray diffractometer; Carl Zeiss Jena, UV-VIZ-NIR-IR; FTIR Perkin-Elmer spectrophotometer; FEI/Phillips USA scanning electron microscopy (SEM)/transmission electron microscopy (TEM); complex laser equipment for material processing Nd:YAG or CO2 type and high power laser 15TW, 25fs, for nano-materials modeling and processing; Möller interferometer; extensive capabilities to deposit thin films by Pulsed Laser Deposition technique (using a KrF laser and several special equipped chambers) for fundamental studies a special furnace (Carbolite) for heat treatments under vacuum or various atmospheres up to a temperature of 1800 oC; Nabertherm and Linton electrical furnaces equipped with superkanthal and silite elements with controllers for atmosphere and temperature; Shimadzu analytical balance with density kit, pH-meter, Linseis Dilatometer, melting furnaces, annealing furnaces, cutting and polishing equipment.

P2-Existent equipment:
Furnace for thermal treatment with controlled environment MEV; Sintering furnace high temperature (UK); Spinner Delta 10 TT (Suss MicroTec); Vacuum deposition; Microwave soldering station; Vertical laminar flow VLF; Orizontal laminar flow HLF; Thin films measurement Thaly-step “TAYLOR-HOBSON”; Metallographic microscope; Photometer/radiometer; Caracterograph Tectronix 576; Oscilloscope Tektronix 466; Pulse generator Wavetek; Resistivity measurement equipment FOXBORO; Interpherometer ZYGO PM2; AC/DC supply source; Elipsometer GSS; Pick and place EPE Technology 20/20; Oscilloscope Tektronix 467; Ultrapure water system Centra R 200.

P3-Existent equipment:
X-ray Diffractometer (Rigaku, DMAX-III C); X-ray Diffractometer rotative anode + (AXS-Bruker, D5000); Sequential X-Ray Fluorescence spectrometer (WDXRF, PANalytical, Axios); SEM-EDS (Zeiss-Auriga), SEM (ZEISS, DSM 960); EDS (Oxford Instruments INCAx-sight); Inverted optical microscope (Leica, DMI 5000 M); DSC-TG (Linseis STA PT 1600), DSC (Netzch 204 F1 Phoenix) NMR (Bruker Avance III 300MHz), Dilatometer (Adamel D.I.24); Horizontal and muffle furnaces (up to 1600 ºC); He-pycnometer (Micromeritics, Accupyc 1330); IR Spectrometer (Mattson, 7000 FT-IR ); UV-VIS-NIR double beam spectrometer (Shimadzu, UV3100PC); Keithley 617 Model Programmable.